An integrated long distance plasma source provides the reverberating gases required for semiconductor wafer processing. The AX7695 integrates a quartz vacuum chamber, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly in the tooling chamber with an extremely clean, low-cost atom free radical source that brings the desired response on the wafer at a lower level of complexity.

The RPS AX7695 Long Distance Plasma Source is an advanced device for generating and manipulating plasma. Plasma is an ionized gas composed of ions, electrons, and neutral particles that plays an important role in many industrial and scientific uses. The specific characteristics and use of the RPS AX7695 long distance plasma source may vary by manufacturer and specific configuration, but in general, the device may have the following characteristics:

1. High efficiency: It may be able to generate high density plasma, and then provide efficient processing power.

2. Long distance operation: The device may be planned for long distance operation, which means that the operator can control the generation and use of plasma outside of a safe interval, and then improve safety and safety